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Semiconductor Parts Cleaning Systems

JST collaborates closely with customers to provide innovative cleaning solutions for complex parts, ensuring reduced chemical usage, a smaller equipment footprint, and efficient automation that drives the highest return on…

Batchspray Four

General features Solvent replacement: Replace your solvents for polymer removal after dry etching. H2SO4 & H2O2 replacement: Replace sulfuric acid & hydrogen peroxide for RCA clean. FSI replacement: Replace FSI…